The Department of Commerce, specifically the National Institute of Standards and Technology (NIST), has issued a Special Notice regarding its intent to sole source a contract for High-Speed, Distributable Monte Carlo Simulation for Scanning Electron Microscope (SEM)-based Overlay Metrology. This procurement aims to acquire advanced software solutions that will enhance the precision and efficiency of overlay metrology processes, which are critical for semiconductor manufacturing and related applications. The software is expected to support the development of high-speed simulations that can be distributed across multiple computing environments, thereby improving measurement accuracy and throughput. Interested parties can reach out to Jenna Bortner at jenna.bortner@nist.gov or Forest Crumpler at forest.crumpler@nist.gov for further inquiries regarding this opportunity.