Combined Sources Sought Notice/Notice of Intent to Sole Source for reference material for Total-Reflection X-ray Fluorescence (TXRF)
ID: NIST-FY25-CHIPS-0058Type: Sources Sought
Overview

Buyer

COMMERCE, DEPARTMENT OFNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYDEPT OF COMMERCE NISTGAITHERSBURG, MD, 20899, USA

NAICS

Testing Laboratories and Services (541380)

PSC

LABORATORY EQUIPMENT AND SUPPLIES (6640)
Timeline
    Description

    The Department of Commerce, specifically the National Institute of Standards and Technology (NIST), is issuing a Combined Sources Sought Notice and Notice of Intent to Sole Source for reference materials related to Total-Reflection X-ray Fluorescence (TXRF). NIST aims to develop new Standard Reference Materials (SRMs) crucial for semiconductor manufacturing, specifically seeking TXRF reference materials containing trace amounts of Ni and Zn on silicon substrates, high-dose shallow boron implants in silicon, and hydrogen concentrations in various silicon compounds. This initiative is part of the CHIPS program, emphasizing the importance of these materials in ensuring quality and consistency in semiconductor production. Interested vendors should submit their capabilities, product specifications, and customer references to Forest Crumpler at forest.crumpler@nist.gov, as responses will inform NIST's market research and potential sole source contract with Cerium Laboratories LLC.

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    Posted
    The National Institute of Standards and Technology (NIST) is issuing a Combined Sources Sought Notice and a Notice of Intent to Sole Source for reference materials for Total-Reflection X-ray Fluorescence (TXRF). NIST plans to award a Sole Source contract to Cerium Laboratories LLC unless other capable sources are identified. The project, part of the CHIPS initiative, aims to develop new Standard Reference Materials (SRMs) essential for semiconductor manufacturing. Specifically, NIST seeks three types of reference materials: TXRF reference materials containing trace Ni and Zn on Si substrates, high-dose shallow boron implants in Si, and hydrogen concentrations in polycrystalline silicon, silicon dioxide, and silicon nitride. Interested companies must provide information regarding their capabilities, products, and services that can fulfill the stated requirements while adhering to U.S. manufacturing standards. Responses must include detailed specifications, potential customization options, and any customer references, ensuring alignment with NIST's objectives. This notice serves as market research and does not constitute a formal solicitations or a commitment to contract. Responses should be comprehensive yet concise, allowing NIST to assess vendor capabilities effectively.
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