The Department of Commerce, specifically the National Institute of Standards and Technology (NIST), is seeking to upgrade the resonant soft X-ray scattering (RSoXS) through station at the National Synchrotron Light Source II (NSLS-II) as part of the CHIPS Metrology program. The upgrade aims to enhance the station's capabilities for measuring microstructures and local chemistry in various soft matter systems, including those used in photolithography and organic electronics, by incorporating soft X-ray reflectivity and resonant critical dimension small angle scattering (res-CDSAXS). The project is intended to improve the throughput and efficiency of the RSoXS station, which is vital for advancing materials characterization in scientific research. Interested parties are encouraged to respond to this notice by contacting Tracy Retterer or Donald Collie via email, providing relevant company information and capabilities, with responses due as soon as possible.