NIST has issued a sources sought notice, NIST-SS26-CHIPS-25, to conduct market research for a Coupled Device Detector Camera System. This system is crucial for the CHIPS RF Waveform and Rapid Frequency Comb Diagnostics for Plasma Etching Project (5.04), aimed at improving plasma etching efficiencies through in situ optical diagnostics. The project requires an intensified electron multiplication charge coupled device (IEMCCD) camera with ultra-low noise, high gain, and an integrated intensifier, capable of fast optical emission spectroscopy (OES) measurements at 13.56 MHz. Essential technical specifications for the camera include a back-illuminated EMCCD sensor, 18mm or larger Gen III intensifier with 1 nanosecond or less gating time, specific quantum efficiencies, and various noise and cooling requirements. The solicitation also specifies software requirements for camera control, data acquisition, and analysis compatible with 64-bit Windows 10. Respondents are asked to provide company information, product technical specifications, performance capabilities, manufacturing details, NAICS code information, available services, standard terms, pricing, and customer references.