Low Cost Technologies for Manufacturing of Thin Film Lithium Niobate
ID: AF25A-T001Type: BOTH
Overview

Topic

Low Cost Technologies for Manufacturing of Thin Film Lithium Niobate

Agency

Agency: DODBranch: USAF

Program

Type: STTRPhase: BOTH

Topic Link

https://www.dodsbirsttr.mil/topics-app/

Additional Information

https://www.dodsbirsttr.mil/topics-app/
Timeline
    Description

    The Department of Defense, specifically the U.S. Air Force, is seeking innovative solutions for the development of low-cost manufacturing processes for Thin Film Lithium Niobate (TFLN), a critical electro-optic material for advanced sensor and communication systems. The objective is to create scalable and versatile manufacturing techniques that can produce high-quality TFLN without relying on the traditional "Smart-Cut" ion implantation method, while also accommodating various film thicknesses and substrates at reduced costs. TFLN is essential for enhancing capabilities in photonics, RF applications, and quantum technologies, making this opportunity significant for both military and commercial applications. Interested parties should prepare to submit proposals by February 5, 2025, with the opportunity details available at the official DOD SBIR/STTR website.

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