High brightness compact X-ray or EUV sources for semiconductor metrology
ID: 6Type: BOTH
Overview

Topic

High brightness compact X-ray or EUV sources for semiconductor metrology

Agency

Department of CommerceNational Institute of Standards and Technology

Program

Type: SBIRPhase: BOTHYear: 2024

Topic Link

https://www.sbir.gov/node/2609727

Additional Information

https://grants.gov/search-results-detail/353574
Timeline
  1. 1
    Release Apr 16, 2024 12:00 AM
  2. 2
    Open Apr 16, 2024 12:00 AM
  3. 3
    Next Submission Due Jun 14, 2024 12:00 AM
  4. 4
    Close Jun 14, 2024 12:00 AM
Description

The Department of Commerce, specifically the National Institute of Standards and Technology, is seeking proposals for the FY2024 Small Business Innovation Research (SBIR) Program for CHIPS for America – CHIPS Metrology. The solicitation is open and the deadline for applications is June 14, 2024.

The specific topic of the solicitation is "High brightness compact X-ray or EUV sources for semiconductor metrology." The research aims to develop high brightness compact X-ray or extreme ultraviolet (EUV) sources for semiconductor metrology applications.

The technology or research being solicited has potential applications in the semiconductor industry for metrology purposes. It can enable more accurate and efficient measurement of semiconductor devices, leading to improved manufacturing processes and higher quality products.

The project duration and funding specifics are not provided in the document. For more information and to submit a proposal, interested parties can visit the SBIR topic link (https://www.sbir.gov/node/2609727) and the solicitation agency URL (https://grants.gov/search-results-detail/353574).

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