Primary S-Parameter Standards for Plasma Etching Record
Contract Opportunity Analysis
The National Institute of Standards and Technology is seeking primary S-parameter standards for plasma etching research to improve semiconductor manufacturing metrology. The work calls for mechanical drawings and DIN 7/16 offset shorts, along with dimensional measurements needed to establish traceable S-parameter measurements for high-power waveform metrology. Key technical requirements include DIN 7/16 connectors made to the IEEE 287.1-2021 metrology grade pin connector specification, seven offset shorts of specified lengths, and 28 dimensional measurements with uncertainties, with inspection and testing used to verify compliance. Quotations are due by March 16, 2026 at 4:00 PM ET by email to ranae.armstrong@nist.gov and donald.collie@nist.gov, questions are due by March 11, 2026, and an active SAM.gov registration is required.