NOTICE OF INTENT-BMF HF Vapor Etcher

NIST-Boulder's Boulder Micro-Fabrication Facility (BMF) requires an HF vapor etching system to replace its current unit, which only handles substrates up to 100 mm, with a new system capable of handling up to 150 mm. This contract aims to procure a new, compliant HF vapor etcher and offers an option for trade-in credit for the existing unit. The new system must adhere to strict safety and technical specifications, including using liquid HF, meeting industry standards for HF handling, and being compatible with an ISO Class 5 cleanroom. Key requirements include processing capabilities for various substrate sizes (5x5 mm to 150 mm wafers), specific etch rates (3-30 um/hour for SiO2), and high etch uniformity. The unit must be a tabletop model, fit within defined spatial constraints, and allow users to process samples without direct HF interaction. Deliverables include the HF vapor etching unit within one year ARO, with payment contingent upon installation, acceptance, and successful performance testing at NIST's facility in Boulder, CO. The system must also come with a minimum one-year warranty covering parts, labor, and other aspects.