Custom High-Vacuum E-Beam Evaporation System

The Lawrence Berkeley National Laboratory (LBNL), operated by the University of California for the U.S. Department of Energy, has issued Request for Information (RFI) No. KT-2026-01. The purpose of this market research is to identify capable sources to design and provide a Custom High-Vacuum E-Beam Evaporation System to support the Advanced Light Source (ALS) Division in thin-film deposition. Preliminary technical requirements specify a nominal throw distance of approximately 1.0 meter, a dedicated substrate load-lock assembly (handling up to 200 mm x 40 mm x 50 mm substrates), and an in-situ motorized tilting stage ($\pm95^{\circ}$). Additionally, the system must support dual ion beam capabilities (one gridded and one gridless source) and fit within dimensions of 8 feet x 7 feet x 7.5 feet, with power constraints of 208V three-phase and 100A. The acquisition falls under NAICS code 333242 (Semiconductor Machinery Manufacturing) with a small business size standard of 1,500 or fewer employees. Interested vendors should email product literature, technical specifications, and the country of manufacture to Procurement Representative Karen Tays (kktays@lbl.gov) by 5:00 p.m. Pacific on September 25, 2026. This RFI is strictly for planning purposes and does not constitute a formal solicitation.