BSA RFI-Tabletop Maskless Optical Writer
ID: 471842Type: Sources Sought
Overview

Buyer

ENERGY, DEPARTMENT OFENERGY, DEPARTMENT OFBROOKHAVEN NATL LAB -DOE CONTRACTORUpton, NY, 11973, USA

NAICS

Analytical Laboratory Instrument Manufacturing (334516)

PSC

OPERATION OF GOVERNMENT-OWNED CONTRACTOR-OPERATED (GOCO) R&D FACILITIES (M1HA)
Timeline
    Description

    The Department of Energy, through Brookhaven National Laboratory (BNL), is seeking information from qualified vendors regarding the acquisition of a tabletop maskless optical writer. This system is intended for advanced 2D and 3D photolithography applications, requiring capabilities such as operation in both raster and vector modes, a compact design, and the ability to handle various substrate sizes while achieving sub-micrometer resolution. The procurement is crucial for enhancing research capabilities in nanotechnology and materials science, with a focus on precision and efficiency in photolithography processes. Interested parties must submit their capabilities and responses to the attached RFI document by 5:00 PM Eastern Time on November 24, 2025, via email to Aaron Hagler at ahagler@bnl.gov, with the subject line “BSA RFI-471842.”

    Point(s) of Contact
    Aaron Hagler
    ahagler@bnl.gov
    Files
    Title
    Posted
    The Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL) is seeking information for the acquisition of a tabletop maskless optical writer. This system will enable 2D and 3D photolithography with sub-micrometer resolution without requiring physical photomasks. Key requirements include operation in both raster and vector modes with various optical sources, a compact physical footprint (60” W × 30” D), and the ability to handle substrate sizes from 5x5 mm² to 150x150 mm². The system must feature a stage controllable by linear motors, vacuum chucks, and anti-vibration tables. Optical specifications demand at least one 365 nm UV LED for raster mode and diode lasers (350-410 nm) for vector mode, along with an intensity measurement unit and camera systems for overview and alignment (down to 500 nm accuracy). Exposure capabilities include a 150x150 mm² area, optical autofocus, minimum feature size of 600 nm, and grayscale exposure up to 256 levels. The system must include a Windows 11 computer with GUI software for control. Vendors are responsible for installation and ensuring compliance with electrical codes and safety standards for UV and laser radiation. The RFI also includes a series of questions for vendors regarding tool specifications, site preparation, warranty, and installation history.
    Lifecycle
    Title
    Type
    Sources Sought
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